Physical Compact Modeling and Analysis of Velocity Overshoot in Extremely Scaled CMOS Devices and Circuits

LX Ge,JG Fossum,B Liu
DOI: https://doi.org/10.1109/16.944198
IF: 3.1
2001-01-01
IEEE Transactions on Electron Devices
Abstract:A compact physics-based velocity-overshoot model is developed, implemented in metal oxide semiconductor field-effect transistor (MOSFET) circuit models, verified based on measured current-voltage data and Monte Carlo-simulation results, and demonstrated in performance projections for 25 nm bulk-Si complementary metal-oxide-semiconductor (CMOS). The demonstration, involving predicted current-voltage characteristics and ring-oscillator propagation delays, reveals a significant benefit of velocity overshoot, or quasi-ballistic transport, in extremely scaled nMOS and even pMOS devices, although the on-state currents are well below the ballistic limits. Physical insight afforded by the model reveals why the ballistic limits are not being reached in scaled bulk-Si CMOS technologies.
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