Local Clustering 3-D Stacked Cmos Technology For Interconnect Loading Reduction

Xinnan Lin,Shengdong Zhang,Xusheng Wu,Mansun Chan
DOI: https://doi.org/10.1109/TED.2006.874157
IF: 3.1
2006-01-01
IEEE Transactions on Electron Devices
Abstract:A three-dimensional (3-D) stacked CMOS technology is developed to closely pack devices in a number of standard cells to form local clusters. Based on the 3-D stacked CMOS technology, an analysis to extend the technology to implement standard cell-based integrated circuits is performed. It is found that the 3-D stacked CMOS technology can reduce the size of an overall IC by 50 % with significant reduction in interconnect delay. A thermal analysis is also performed. It was found that the rise in temperature in 3-D ICs could be lower than that of traditional planar ICs under the condition of same propagation delay since the required power supply voltage of 3-D ICs to achieve the same performance is lower.
What problem does this paper attempt to address?