Photovoltaic effects in InGaN structures with p–n junctions

Cuibai Yang,Xiaoliang Wang,Hongling Xiao,Junxue Ran,Cuimei Wang,Guoxin Hu,Xinhua Wang,Xiaobin Zhang,Jianping Li,Jinmin Li
DOI: https://doi.org/10.1002/pssa.200723202
2007-01-01
Abstract:InGaN photovoltaic structures with p-n junctions have been fabricated by metal organic chemical vapour deposition. Using double-crystal X-ray diffraction measurements, it was found that the room temperature band gaps of p-InGaN and n-InGaN films were 2.7 and 2.8 eV, respectively. Values of 3.4 x 10(-2) mA cm(-2) short-circuit current, 0.43 V open-circuit voltage and 0.57 fill factor have been achieved under ultraviolet illumination (360 nm), which were related to p-n junction connected back-to-back with a Schottky barrier and many defects of the p-InGaN film. 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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