Influence of Annealing Temperature on Photoelectrochemical Performance of Nb-doped SrTiO3 Film

WANG Gai-tian,TU Jing-ping,WANG Shu-fen,WANG Xiu-li
DOI: https://doi.org/10.3321/j.issn:0529-6579.2007.z1.007
2007-01-01
Abstract:The photoelectrochemical performances of Nb-doped SrTiO3 films and their photochargeability to hydrogen storage alloy films were investigated. The Nb-doped SrTiO3 films were deposited on nickel substrate by rf magnetron sputtering. After annealed at 300~600℃, the LaNi3.9Al1.3 hydrogen storage alloy films were deposited on the back of the Ni substrate by DC magnetron sputtering to form the Nb-doped SrTiO3/Ni/hydrogen storage alloy (SHN) electrodes. With increasing the annealing temperature of the SrTiO3 film, the anodic photocurrent and photochargeability first increased, then decreased.
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