Simulation of Low-Energy Electron Scattering in Electron Beam Exposure

Luo Xiaobin,Yu Zhaoxian
DOI: https://doi.org/10.3969/j.issn.1671-4776.2009.01.011
2009-01-01
Abstract:Pendry elastic scattering cross section was introduced.The scattering process of electrons in solids was described,such as the determination of scattering step size,scattering angle,azimuth angle and energy at scattering points.Furthermore,Pendry cross section and Monte Carlo calculation method were applied to the electron scattering process.The scattering track of the low-energy electron beam under 5 keV in PMMA resists was simulated by changing incident energy of electron beam,thickness of resists and substrate materials,respectively.The simulation results show that the low-energy electron beam lithography can be used in surface imaging technology with high resolution.Comparison of the simulation results and the experiments of the electron beam lithography shows that the cattering model can be improved,the favourable conditions can be created to deeply develop the application research on electron beam lithography technique,and the theoretical basis is provided for exploring the low-cost system of low-energy electron beam lithography.
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