Gas Temperature, Electron Density and Electron Temperature Measurement in A Microwave Excited Microplasma

Xi-Ming Zhu,Wen-Cong Chen,Yi-Kang Pu
DOI: https://doi.org/10.1088/0022-3727/41/10/105212
2008-01-01
Abstract:Gas temperature, electron density and electron temperature of a microwave excited microplasma are measured by optical emission spectroscopy. This microplasma is generated in the small gap of a microstrip split-ring resonator in argon at near atmospheric pressure. When less than 100 ppm of water is present in the plasma, the gas temperature can be obtained from the rotational temperature of the hydroxyl molecule (A (2) Sigma(+), upsilon = 0) and the electron density can be measured by the Stark broadening of the hydrogen Balmer beta line. According to a collisional-radiative model, the electron temperature can be estimated from the measured excitation temperature of argon 4p and 5p levels. It is found that the values of these parameters (gas temperature, electron density and temperature) increase when the gap width of the resonator is reduced. However, when the microwave power increases, these parameters, especially the electron density, do not vary significantly. Discussions on this phenomenon, being very different from that in the low-pressure bounded discharges, are provided.
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