Growth and Characterization of Algan/Gan Superlattices

WP Guo,H Hu,XY Zhou,T Wu,CZ Sun,Y Luo
DOI: https://doi.org/10.1117/12.482214
2002-01-01
Abstract:(Al)GaN semiconductors have many important applications in high temperature, high power and high frequency electronic devices such as HEMT and HBT, as well as in blue laser diodes, UV LEDs and detectors. In this work, AlGaN/GaN superlattices have been grown by low-pressure metal-organic vapor phase epitaxy (LP-MOVPE) and characterized by high-resolution X-ray diffraction (HRXRD), atomic force microscopy (AFM), and photoluminescence (PL). The HRXRD measurements show that the crack-free epi-layer grown at optimized condition has very flat interface and good crystal quality. The AFM data also affirmed the HRXRD results with a root-mean-square roughness' as low as 0.3 nm. The possible origin has also been proposed for the two peaks observed in the PL spectrum of Mg-doped AlGaN/GaN superlattices.
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