LaB6 Thin Films Prepared by Electron Beam Evaporation and Its Property

SHI Qing-xuan,LIN Zu-lun,LI Jian-jun,CHEN Ze-xiang
DOI: https://doi.org/10.3969/j.issn.1005-9490.2007.03.004
2007-01-01
Abstract:LaB6 thin films were deposited on Ta substrates by electron beam evaporation technique.The surface morphology and composition of the films were characterized by scanning electron microscope and X-ray photoelectron spectrometer.The work functions of the films were measured by thermal electron beam method.The results indicated that the films prepared by the electron beam evaporation method had little nonstoichiometric mixture of atoms and good surface status.The measurement of the work function is 2.59 eV,and it shows an excellent emission character.
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