Studies of Diamond-like Carbon Films Deposited on Copper Substrate With Ti/TiC and Si/SixNy Intermediate Layers

王静,刘贵昌,汲大鹏,徐军,邓新禄
DOI: https://doi.org/10.3969/j.issn.1672-7126.2006.05.013
2006-01-01
Abstract:Diamond-like carbon(DLC) films were grown on copper substrate coated with an intermediate layer by magneto-sputtering physical vapor deposition(MS-PVD) and by microwave electron cyclotron resonance(MW-ECR) plasma enhanced chemical vapor deposition(PECVD).Raman spectroscopy result indicates that the films show an amorphous structure and typical characteristics of DLC films.The morphology of DLC was characterized by atomic force microscopy (AFM) and the hardness and modulus were analyzed by nanoindentation.The difference of DLC films deposited on copper substrate with Ti/TiC and Si/Si_xN_y intermediate layers was discussed.
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