Abstract:Nanoparticle monolayers (NPMLs) exhibit unique collective properties that are highly desirable for applications in sensors, catalysts, and optics. However, their practical use is often hindered by structural instability, especially when they are exposed to solvents. In this study, we developed a method for the spontaneous deposition of gold nanoparticle monolayers (AuNPMLs) on silicon substrates via covalent bonding interactions that provides excellent structural stability in solvents with varying polarities. The esterification reaction between carboxyl-functionalized gold nanoparticles and alkyl-chloride-functionalized silicon substrates spontaneously forms AuNPMLs on the substrate in which single-crystalline domains are interconnected, forming a percolation network morphology. The ex situ scanning electron microscopy measurements show that the surface coverage of AuNPMLs rapidly increases up to ca. 60% during the initial 10 min, followed by gradual growth and saturation at ca. 70% at 360 min of deposition time. On the other hand, the single-crystalline domain size reaches its maximum at 45 min and then gradually decreases, which may be attributed to the desorption of AuNPs by the hydrolysis of ester bonds. The reflectance spectra of AuNPMLs showed the red shift as the deposition time increases up to 45 min with a subsequent blue shift thereafter, which is consistent with the change of the single-crystalline domain size with the deposition time. The covalent bonding interaction-mediated nanoparticle deposition method can be used to form stable AuNPMLs with controlled surface coverage and domain size, allowing for fine control of the optical properties and possibly other properties. The excellent structural stability of AuNPMLs and their controlled properties may provide new opportunities for practical applications of NPMLs.

Deposition of Passivated Gold Nanoclusters Onto Prepatterned Substrates

Patterning of Supported Gold Monolayers Via Chemical Lift-off Lithography

Interaction of Passivated Clusters in Solution with Micro-Patterned Surfaces: Guided Flow Versus Defect Pinning

Electron Beam Lithography in Passivated Gold Nanoclusters

Assembling Gold Nanoparticles on Ultrasmooth Silicon Surface

Nanopatterned Assembling of Colloidal Gold Nanoparticles on Silicon

Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

Gold Nanoparticle Patterning of Silicon Wafers Using Chemical E-Beam Lithography.

Manipulation of Passivated Gold Clusters on Graphite with the Scanning Tunneling Microscope

Polyelectrolyte Multilayer As Matrix for Electrochemical Deposition of Gold Clusters: Toward Super-Hydrophobic Surface

Patterned Au/poly(dimethylsiloxane) substrate fabricated by chemical plating coupled with electrochemical etching for cell patterning.

Mechanism of Electron-Beam Writing in Passivated Gold Nanoclusters

Esterification-Induced Spontaneous Deposition of Nanoparticle Monolayers on Substrates with Percolation Network Morphology

Direct Electron Beam Writing of Nanostructures Using Passivated Gold Clusters

Fabrication of micropatterns of nanoarrays on a polymeric gel surface.

Molding Process Retaining Gold Nanoparticle Assembly Structures during Transfer to a Polycarbonate Surface

Molecular Patterning and Directed Self-Assembly of Gold Nanoparticles on GaAs

Electrostatically Stabilised Nanoparticles: Self-Organization and Electron-Beam Patterning.

Hreels Study of Alkanethiol Passivated Gold Clusters on Graphite

Self-Assembly of Gold Nanoparticles on Nanometre-Patterned Surface

Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask