Pure-Silica-Zeolite Low-Dielectric Constant Materials

Christopher M. Lew,Minwei Sun,Yan Liu,Junlan Wang,Yushan Yan
DOI: https://doi.org/10.1016/B978-0-444-53189-6.00013-5
2009-01-01
Abstract:The intrinsic porous and crystalline nature of pure-silica-zeolites allows them to have many of the desired features necessary for a low-dielectric constant (low-k) material for next-generation microprocessors. Several different zeolite films have been prepared, including in situ, seeded-growth, spin-on and zeolite/polymer hybrid materials, and they have been characterized for k value, mechanical properties, hydrophobicity and pore structure. This chapter focuses on the latest developments in the synthesis and characterization of pure-silica-zeolites as low-k materials.
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