Effects of Ta Seed Layer on the Microstructure and Magnetic Property of Ni65co35 Films

Wang Lijin,Zhang Hui,Teng Jiao,Zhu Fengwu
IF: 1.797
2006-01-01
ACTA METALLURGICA SINICA
Abstract:Ta(x nm)/Ni65Co35 (40 nm) bilayers films (x = 0, 1, 2, 3, 4, 5 nm) have been prepared by DC magnetron sputtering. The effects of the thickness and deposition rate of Ta seed layer on anisotropic magnetoresistance (AMR) and coercivity of Ni65Co35 (40 nm) layer were investigated. XRD and magneto-test showed that a suitable thickness and higher deposition rate of Ta layer could AA promote the formation of Ni(65)Co3(5) layer with (111) texture, and remarkably increase the AMR value of Ni65Co35 layer and the sensitivity of magnetic sensor element.
What problem does this paper attempt to address?