Self-Assembled Low-Dimensional Nanomaterials Via Low-Temperature Plasma Processing

K. Ostrikov,I. Levchenko,S. Xu,S. Y. Huang,Q. J. Cheng,J. D. Long,M. Xu
DOI: https://doi.org/10.1016/j.tsf.2007.11.045
IF: 2.1
2008-01-01
Thin Solid Films
Abstract:Examples of successful fabrication of low-dimensional semiconducting nanomaterials in the Integrated Plasma-Aided Nanofabrication Facility are shown. Self-assembled size-uniform ZnO nanoparticles, ultra-high-aspect ratio Si nanowires, vertically aligned cadmium sulfide nanostructures, and quarternary semiconducting SiCAlN nanomaterial have been synthesized using inductively coupled plasma-assisted RF magnetron sputtering deposition. The observed increase in crystallinity and growth rates of the nanostructures are explained by using a model of plasma-enhanced adatom surface diffusion under conditions of local energy exchange between the ion flux and the growth surface. Issues related to plasma-based growth of low-dimensional semiconducting nanomaterials are discussed as well. (C) 2007 Elsevier B.V. All rights reserved.
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