Crystallization Kinetics of Amorphous GdTbFe Film

KM YANG,YJ WANG,Q TANG
DOI: https://doi.org/10.1016/0022-3093(88)90369-9
IF: 4.458
1988-01-01
Journal of Non-Crystalline Solids
Abstract:The phase transition for amorphous GdTbFe film, prepared by magnetron sputtering, has been investigated by the measurement of resistivity and the analysis of X-ray diffraction. Using the plots from both the Johnson-Mehl-Avrami and the Kissinger equations, the parameters of crystallization kinetics, δE and n, are obtained. The experimental results show that thermal stability for GdTbfe is of advantage over the binary system, GdCo or GdFe.
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