Plasma Etching and Parameters Optimizing for Flexible PI Substrate to Produce Flying Lead

JIN Yi,HE Wei,ZHOU Guo-yun,WANG Shou-xu,MO Yun-qi,CHEN Lang,WANG Song,HE Bo
DOI: https://doi.org/10.3969/j.issn.1009-0096.2009.08.008
2009-01-01
Abstract:The production of flying lead is one of the difficulties in the production of flexible printed circuit boards.It needs to etch the PI(polyimide)substrate in certain areas to meet the requirements of design.At the present time,there are processes of punching,numerical control milling,chemical etching and plasma etching to open windows on the PI substrate.Among them,the plasma etching process is highly accurate,easy to operate and clean to environment,but relatively high operating cost limiting the production.In this paper,we use orthogonal design to optimize parameters of plasma etching PI process to make full use of plasma gas,shorten the time for plasma etching process and greatly reduce the cost of plasma etching process.Finally,we complete the production of the flying lead.
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