Calibration technique for MEMS membrane type strain sensors

L. Cao,T. S. Kim,J. Zhou,S. C. Mantell,D. L. Polla
DOI: https://doi.org/10.1109/UGIM.1999.782854
1999-01-01
Abstract:A MEMS based piezoresistive strain sensor was designed, fabricated and calibrated. A single strip of doped n-polysilicon sensing material was patterned over a thin Si3N4/SiO2 membrane. The silicon wafer was etched beneath this thin membrane. The intent of this design was to fabricate a flexible MEMS strain sensor. A calibration technique for measuring the strain sensor performance is described. The sensor calibration technique (to find the relationship between change in resistance and strain) entails developing a repeatable relationship between the change in sensor resistance and the strain measured at the sensor. The sensor sensitivity is evaluated by embedding the sensor in a vinyl ester epoxy plate and loading the plate. This calibration technique captures the effects of strain transfer to the stiff silicon wafer
What problem does this paper attempt to address?