Growth and Characterization of Si-doped GaAs Crystals for LED Application

Min JIN,Jia-yue XU,Yong-zheng FANG,Qing-bo HE,Ding ZHOU,Hui SHEN
2012-01-01
Abstract:Si-doped <511>orientation GaAs crystal was grown by Bridgman method.PBN crucible with a seed well was used and quartz ampoule was adopted to protect the evaporation of As in the process of growth.The doping technology,solid-liquid interface morphology and growth defects were investigated.The twinning was a crucial problem for the pulling-down growth of Si-doped < 511> GaAs crystal.The formation mechanism of the twins was suggested and the growth parameters were optimized.2-inch Sidoped GaAs crystal has been grown successfully and X-ray rocking curve showed that FWHM was about 40 arcsec.
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