Control and Measurement of XeF2 Concentration in Chamber of XeF(C-A) Laser Operating on Repetition Mode

HUANG Chao,YU Li,MA Lian-ying,YI Ai-ping,AN Xiao-xia,LI Hui,CHEN Guang-yu,LIU Jing-ru
2006-01-01
High Power Laser and Particle Beams
Abstract:The principle of real time measurement XeF_2 concentration by absorbed spectrum and XeF_2 concentration control means in laser chamber are introduced.Relation of XeF_2 concentration between laser chamber and measure cell is given.XeF_2 concentration could be controlled by adjusting the temperature of the XeF_2 generator and the flow velocity in the main and carrier gas-passages.XeF_2 concentrations under different mixed gas flow are obtained.
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