Microstructure of Mg–Ni Thin Film Prepared by Direct Current Magnetron Sputtering and Its Properties As a Negative Electrode

LZ Ouyang,CY Chung,H Wang,M Zhu
DOI: https://doi.org/10.1116/1.1611886
2003-01-01
Abstract:Mg–Ni thin films for nickel–metal hydride batteries electrodes were prepared by direct current magnetron sputtering from a Mg–Ni alloy target on three substrates (glass, Ni foil, and foam Ni substrates) and characterized by differential scanning calorimetry, x-ray fluorescence measurement, energy dispersive spectroscopy, x-ray diffraction, and transmission electron microscopy. The microstructure of the Mg–Ni thin films was found to be composed of an amorphous Mg–Ni phase and Mg2Ni nanocrystalline, regardless the substrates. The amorphous phase is crystallized into Mg2Ni at about 360 °C. The maximal discharge capacity of Mg–Ni thin film being 557 mA h/g was achieved in an alkaline solution.
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