Optical Metamaterials at Near and Mid-Ir Range Fabricated by Nanoimprint Lithography

W. Wu,E. Kim,E. Ponizovskaya,Y. Liu,Z. Yu,N. Fang,Y.R. Shen,A.M. Bratkovsky,W. Tong,C. Sun,X. Zhang,S.-Y. Wang,R.S. Williams
DOI: https://doi.org/10.1007/s00339-006-3834-3
2007-01-01
Abstract:A metamaterial comprising an ordered array of four metallic L-shaped components designed to operate in the mid-IR frequency regime has been fabricated and characterized. The fourfold rotational symmetry of the unit cell should suppress the undesirable bianisotropy observed for split-ring resonators. Nanoimprint lithography was used to demonstrate scalability for mass production. A dipole plasmon resonance with a negative permittivity and a magnetic resonance with a negative permeability were observed at wavelengths of 3.7 and 5.25μm, respectively, in agreement with theoretical predictions.
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