Effective Polarization Control of Metallic Planar Chiral Metamaterials with Complementary Rosette Pattern Fabricated by Nanoimprint Lithography

Shao-Ren Deng,Bing-Rui Lu,Bi-Qing Dong,Jing Wan,Zhen Shu,Jing Xue,Yifang Chen,Ejaz Huq,Ran Liu,Xin-Ping Qu
DOI: https://doi.org/10.1016/j.mee.2009.11.123
IF: 2.3
2010-01-01
Microelectronic Engineering
Abstract:In this work the interaction between the metallic planar chiral metamaterials (PCM) with complementary rosette pattern and the incident electromagnetic wave was studied theoretically using finite difference time domain (FDTD) method. Both the evolution of the electric field distribution as the electromagnetic wave propagated through this PCM and the optic activity in near infrared range were investigated. By utilizing nanoimprint lithography technology, we successfully fabricated metallic PCM with complementary rosette pattern with period of 600nm. The measurement results of polarization rotation capability indicate that by easily tuning the depth of the imprint depth in SU-8, the optical activity of this metallic PCM could be effectively controlled for specific wavelength.
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