Molecular Beam Epitaxial Growth, Characterization and Performance of High-Detectivity GaInAsSb/GaSb PIN Detectors Operating at 2.0 to 2.6 Μm

AZ LI,JQ ZHONG,YL ZHENG,JX WANG,GP RU,WG BI,M QI
DOI: https://doi.org/10.1016/0022-0248(95)80163-4
IF: 1.8
1995-01-01
Journal of Crystal Growth
Abstract:Molecular beam epitaxy has been employed to grow GaxIn1−xAs1−ySby PIN detectors operating at 2.0 to 2.6 μm on (100)-oriented GaSb substrates. The epitaxial layers were characterized by X-ray double-crystal diffraction, Fourier transform infrared spectroscopy, electron microprobe analysis, and Hall effect measurements. The background hole concentration and mobility at room temperature are (4–5) × 1016 cm−3, 254 cm2/V·s and 9 × 1015 cm−3, 970 cm2/V·s for GaInAsSb and GaSb, respectively. For a PIN mesa front-illuminated photodetector, a maximum external quantum efficiency of 65% without anti-reflection coating and a peak detectivity Dλ∗ at 2.5 μm of 3.0 × 109 cm Hz1/2/W with a cut-off wavelength of 2.6 μm at room temperature have been achieved.
What problem does this paper attempt to address?