Abstract:Boron carbide (B4C) is superhard, but its engineering applications are limited by the abnormal brittle failure arising from amorphous shear band formation. Mitigating the local amorphization is essential to improve the ductility of B4C. Here, we carried out ab initio molecular dynamics (AIMD) simulations to examine the response of B4C to shear along two plausible slip systems (001)/[100] and (111)/[112¯] at finite temperature. We found that the icosahedra of B4C gradually deconstruct at finite temperature, resulting in local amorphization, thereby giving rise to a lower stress barrier than that of density functional theory simulations at zero temperature. The deconstruction of the icosahedral clusters arises from the interaction with the neighboring chains. The failure mechanism at the finite temperature suggested that the local amorphization can be suppressed by altering the structure of the 12-atom icosahedron and the 3-atom chain of B4C. To demonstrate this, we replaced the B11CP icosahedron in B4C with B12 icosahedron to form boron-rich boron carbide (B13C2) and then performed the same shear deformations. We found that local amorphization significantly decreases, which results from the modified icosahedral interaction. We also altered the 3-atom C-B-C chain to the 2-atom P-P chain and found that the accumulated shear stress can be released through icosahedral slipping, which is achieved by breaking the chains. The icosahedral slipping then prevents the destruction of icosahedra under shear deformations, expected to improve the ductility. Our results demonstrate two design strategies toward improved ductility of B4C: (1) boron enrichment can alleviate amorphous shear band formation in boron carbide, and (2) altering the 3-atom chain to a 2-atom chain and meanwhile decreasing the strength of the chain to make it less stable than the icosahedron cage may lead to an icosahedral-slipping-dominated mechanism, thereby avoiding icosahedral fracture.

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Chemical analysis and vibrational properties of boronated tetrahedral amorphous carbon films

The Structure of Boron-, Phosphorus- and Nitrogen-Doped Tetrahedral Amorphous Carbon Deposited by Cathodic Arc

First-principles molecular dynamics simulations for the properties of boron-doped tetrahedral amorphous carbon

Effects of Applying Stress on the Electron Field Emission Properties in Amorphous Carbon Thin Films

Unraveling the Effects of Boron Incorporated on Tribological Properties of Amorphous Carbon Film under Water Lubrication

Effect of Boron Doping on the Electrical Conduction of Tetrahedral Amorphous Carbon Films

Effect of Trace Boron Addition on the Microstructural Evolution and Mechanical Properties in Ti45al8nb2cr-B Alloys

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Local amorphization in boron carbide at finite temperature: Strategies toward improved ductility

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Molecular Dynamics Investigation of Metastable Structure and Hybridization Bond Evolution in High-Entropy CoCrFeNi Heterostructured Amorphous Carbon Films

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The Effect of Stress Relaxation on the Microstructure and Hardness Evolution of Pure Amorphous‐Carbon and C/Ti Multilayer Films