Abstract:With the continuous development of the field of information technology, there has been a demand for recording mark size of optical data storage, optical imaging resolving power, and characteristic linewidth of photolithography to reach nanoscale. However, it is very difficult to realize the goal due to the optical diffraction limit restrictions. Much interest has focused on the study of optical far-field super-resolution spot by using pupil filters. However, common concerns have continued to plague super-resolving pupil filters based on either scalar diffraction theory or vector diffraction theory. These concerns include the fact that the side lobe becomes non-negligible when the central lobe is squeezed to a certain extent. Moreover, it is difficult to reduce the super-resolving spot to nanoscale. In this work, we proposed a novel method to combine the super-resolving pupil filters with nonlinear saturable absorption thin films to reduce the central spot size to nanoscale, lower the intensity ratio of side lobe to central lobe, and elongate the depth of focus or tunable tolerance distance between the super-resolving spot and sample. The simulated results indicate that by using the three-zone annular binary phase filter as the super-resolving pupil filter and Sb2Te3 as the nonlinear saturable absorption thin films, the central spot size can be reduced to nanoscale, the side lobe intensity is squeezed to about 10% of the central lobe intensity, and the tunable tolerance distance between the super-resolving spot and the sample is about two times that of the depth of focus of the diffraction limited spot at the incident laser wavelength of 405nm and the numerical aperture of focusing lens of 0.95. The combination of the super-resolving pupil filters with the nonlinear saturable absorption thin films is very useful for nano-optical data storage, maskless nanolithography, and nano-optical imaging. It is also easy to use in actual applications because of the operation in the far-field range.

Effect of fabrication errors on superresolution property of a pupil filter.

Effect of Fabrication Errors on Lateral Super-Resolution Property of A Three-Zone Pupil Filter

Effects of Optical Aberrations on Localization of Minflux Super-Resolution Microscopy

Effect of Pupil Filter Position on Superresolution Properties of Confocal Measurement System

Optimization of Transverse Translation Diverse Phase Retrieval for Optical Elements with Mid-Spatial Frequency Errors

Effects of Sinusoidal Mid-Spatial Frequency Surface Errors on Optical Transfer Function

Aberration Effect and Optimization Design of Super-Resolution Telescope Optical System

A three-zone phase-only pupil filter for improving lateral resolution

Effects of Fabrication Errors on MTF and Diffraction Efficiency for Binary Optical Lens

Correction Algorithms of Pupil Aberration for Fourier Ptychographic Microscopy

Effect of Incident Light Field Distribution on Superresolution and DOF of Superresolution Pupil Filter

Influences of Phase Shift on Superresolution Performances of Annular Filters

Design of Super-Resolution Telescopic Imaging Optical System with Relative Large Field-of-View

Fabrication Error Analysis for Diffractive Optical Elements Used in A Lithography Illumination System

The Design and Experiments of the Super-Resolving Annular Binary Filters Based on Genetic Algorithm

Effect of Manufacturing Errors on Focusing Performance of Large-Scale Super-Oscillatory Lens

Design of Three-Dimensional Superresolution Filters and Limits of Axial Optical Superresolution.

Influence of Alignment Error on DMD Super-Resolution Imaging Optical System

Performance improvement of super-resolving pupil filters via combination with nonlinear saturable absorption films

Study of Superresolution with Annular Filters

Achieving Super-Resolution with a Special Phase-Shifting Lens