Abstract:Precise control of the crystal phase of TiO2 by sputtering at room temperature is particularly important for practical applications. In this paper, nanocrystalline TiO2 films were deposited on glass and silicon substrates using DC reactive magnetron sputtering without external heating. The phase composition and preferred orientation of the TiO2 films could be controlled by adjusting the negative bias voltages. It was found that TiO2 films deposited at free negative bias voltage or ground exhibited an anatase single phase with a strong (101) preferred orientation, while the preferred orientation transformed into (211) when the negative bias voltage reached −50V. A further increase in the negative bias voltage induced the formation of an additional rutile phase, thus generating a mixed phase of anatase and rutile. A pure rutile phase was obtained at high negative bias voltage (≥−100V). The rutile phase with (101) preferred orientation could also be obtained by increasing the bias voltages above −125V. In addition, the TiO2 films of different phases performed different photocatalytic activities. The anatase TiO2 films showed higher photocatalytic activity than rutile phase films. Particularly, anatase TiO2 films with (211) preferred orientation showed a significant photocatalytic degradation of organic dye (Rhodamine B), the degradation of which reached over 90% after an irradiation time of 2h.

PHASE CHANGE AND OPTICAL PROPERTIES OF TiO2 THIN FILMS

Annealing Temperature Dependent Microstructure and Optical Properties of HfxTi1-xO2 Thin Films

Influence of Annealing Temperature on Microstructure and Phase Transformations of Oxide System Bi2O3/TiO2 Formed in Aqueous Solutions

Controllable Hydrothermal Synthesis, Optical and Photocatalytic Properties of TiO2 Nanostructures

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Optical Constants and Band Gap Evolution with Phase Transition in Sub-20-nm-Thick TiO2 Films Prepared by ALD

Influence of Annealing Temperature on the Properties of Titanium Oxide Thin Film

Crystallization Behaviors of TiO2 Films Derived from Thermal Oxidation of Evaporated and Sputtered Titanium Films

Morphology, Structure and Optical Properties in TiO_2 Nanostructured Films Annealed at Various Temperatures

TiO2 films prepared by DC reactive magnetron sputtering at room temperature: Phase control and photocatalytic properties

Diffusion of phase boundary and crystallization behaviors for TiO2/SiO2 composite films

Effects of Hyperthermia Induced Crystalline Aggregation on Properties of TiO2 Thin Films

Synthesis, Phase Transition and Optical Properties of Nanocrystalline Titanium Dioxide Films Deposited by Plasma Assisted Reactive Pulsed Laser Deposition

Study of Nanocrystal Tio2 Thin Films by Thermal Annealing

EFFECT OF CRYSTALLINE PHASE FORMATION ON OPTICAL PROPERTIES OF TiSi2 THIN FILMS

Effects of Annealing Temperature on the Structure and Electrochromic Properties of TiO2 Films

Effect of Substrate Temperature on Structural Properties and Photocatalytic Activity of TiO2 Thin Films

Effect of Annealing Temperature on F-doped TiO2 Spin Coated Thin Films

Temperature-induced structural and electronic phase transitions in λ -phase

STRUCTURE AND OPTICAL PROPERTIES OF HIGH-RATE LOW-TEMPERATURE GROWN TiO2 THIN FILMS BY REACTIVE MAGNETRON SPUTTERING

Structure and Optical Properties of TiO2 Thin Film Deposited by Ion Beam Assistant Reactive Electron Beam Evaporation