Nanoimprint Lithography for Fabrication of Three-Terminal Ballistic Junctions in Inp/Gainas

I Maximov,P Carlberg,D Wallin,I Shorubalko,W Seifert,HQ Xu,L Montelius,L Samuelson
DOI: https://doi.org/10.1088/0957-4484/13/5/325
IF: 3.5
2002-01-01
Nanotechnology
Abstract:We present processing technology and characterization results for InP/GaInAs two-dimensional electron gas (2DEG) three-terminal ballistic junction (TBJ) devices manufactured using nanoimprint lithography (NIL). To transfer sub-100 nm features into a high-mobility InP-based 2DEG material, we used SiO2/Si stamps made using electron beam lithography and reactive ion etching. After NIL, the resist residues are removed in oxygen plasma; this is followed by wet etching of InP/GaInAs to define the TBJ structures. Fabricated TBJ devices are characterized using scanning electron microscopy and electron transport measurements. Highly non-linear electrical characteristics as predicted by the theory (Xu H Q 2001 Appl. Phys. Lett. 78 2064) are demonstrated.
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