Adsorption and Thermal Reaction of Dipropyl Sulfide on Skeletal Ni Adsorbents

X. Chu,P. Guo,Y. Pei,S. Yan,H. Hu,M. Qiao,K. Fan,B. Zong,X. Zhang
DOI: https://doi.org/10.1021/jp0708695
2007-01-01
Abstract:The adsorption and reaction of dipropyl sulfide on Raney Ni and rapidly quenched skeletal Ni (RQ Ni) were studied in ultrahigh vacuum by means of X-ray photoelectron spectroscopy (XPS). Dipropyl sulfide physisorbed on both substrates at 103 K. At 173 K, for Raney Ni, the physisorbed dipropyl sulfide disappeared and the chemisorbed dipropyl sulfide was formed, accompanied by the commencement of C-S bond scission. At the same temperature, for RQ Ni, however, physisorbed dipropyl sulfide was still present, bearing comparable intensity with the chemisorbed dipropyl sulfide, and no atomic S from C-S bond scission was detectable. The lower reactivity of RQ Ni toward dipropyl sulfide is attributed to lattice expansion of the Ni crystallites in RQ Ni posed by rapid quenching. By 473 K, the C Is peak intensity was totally lost, leaving only atomic S on both substrates. The implication of this work on the regeneration and design of metallic Ni-based adsorbents was addressed.
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