Oxygen Vacancy Levels and Interfaces of Al2O3

D. Liu,J. Robertson
DOI: https://doi.org/10.1016/j.mee.2009.03.011
IF: 2.3
2009-01-01
Microelectronic Engineering
Abstract:We have calculated the oxygen vacancy levels in Al"2O"3 using first principles methods. They are found to lie just below midgap in the oxide, equivalent to below the Si valence band edge when aligned to the silicon band structure. This low energy accounts for the behaviour of Al"2O"3 in oxide capping layers and as an insulator in future Flash memory.
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