Abstract:Abstract Advances in femtosecond laser-material interaction facilitate the extension of maskless optical processing to the high efficiency and deep-subwavelength scale. Here, a hybrid plasmon lithography technique has been demonstrated by irradiating near-infrared femtosecond laser pulses onto the Si material coated with thin Cr films in a vacuum chamber, and superior nanograting structures are found to deeply penetrate through the thin Cr film into the underlying Si substrate. In stark contrast to the common ripple structures formed on the Si surface, the Cr-layer mediated Si nanograting structures not only exhibit the spatially super-regular arrangements with a deep-subwavelength period of 355 nm but also present the nonsinusoidal sharp-edged groove geometry with a large depth-to-width aspect ratio of 2.1. Theoretical analyses and calculations reveal that the anomalous structure characterizations are physically ascribed to the excitation of dual-interface coupled plasmons in the thin metal layer, which possess the squeezed spatial wavelength and the periodic columnar intensity distributions. Moreover, the further deepening of periodic nanostructures into the Si substrate is also elucidated by the simulation of electric field enhancements at the bottom of shallow grooves under irradiation of subsequent laser pulses. In combination with a wet etching process, the Si nanograting structures can be modified into the smooth and narrow-mouthed V -profiles, whose optical measurements show a near omnidirectional antireflection especially in the visible range of 565–750 nm, which is expected for the design of advanced photonic devices.

Surface-plasmon Polariton Interference Nanolithography Based on End-Fire Coupling

248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

Subwavelength Nanolithography Based on Unidirectional Excitation of Surface Plasmons

Two-Surface-Plasmon-Polariton-Absorption Based Nanolithography

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

Focused Ion Beam Assisted Interface Detection for Fabricating Functional Plasmonic Nanostructures

Controlling the interactions of surface plasmon polaritons generated by two-nanoslit structures for producing diverse sub-diffraction-limited patterns

Two-Surface-Plasmon-Polariton-Absorption Based Lithography Using 400 Nm Femtosecond Laser

Near-field Switching and Focusing Using Plasmonic Nanostructures with Different Polarizations

Photothermal Modulation of Propagating Surface Plasmons on Silver Nanowires

Forty-Nanometer Plasmonic Lithography Resolution with Two-Stage Bowtie Lens

Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling

Nano-patterning based on two-surface-plasmon-polariton-absorption using 400nm femtosecond laser

PLASMONIC FOCUSING BASED ON CdS NANORIBBON

Plasmonic Interference Lithography Based on the Second-Order Diffracted Wave of Grating and Hyperbolic Multilayer Graphene

2D Surface Optical Lattice Formed by Plasmon Polaritons with Application to Nanometer-Scale Molecular Deposition

Periodical Concentration of Surface Plasmon Polaritons by Wave Interference in Metallic Film with Nanocavity Array

Surface-plasmon-assisted nanoscale photolithography by polarized light

Long-range interference of localized electromagnetic field enhancement in plasmonic nanofinger lattices