Surface-plasmon Polariton Interference Nanolithography Based on End-Fire Coupling

Xiaowei Guo,Jinglei Du,Xiangang Luo,Chunlei Du,Yongkang Guo
DOI: https://doi.org/10.1016/j.mee.2007.01.028
IF: 2.3
2007-01-01
Microelectronic Engineering
Abstract:We have preformed finite-difference time-domain (FDTD) analysis of surface-plasmon polaritons (SPPs) interference nanolithography based on end-fire coupling method. The simulated results show the interference of two face-to-face SPPs can fabricate an 80nm periodicity pattern at the incidence wavelength of 365nm, which surprisingly has long decay lengths for transverse and longitudinal directions and are insensitive to the focusing and alignment conditions.
What problem does this paper attempt to address?