Improving the Working Distance for Near-field Lithography with Supercell Photonic Crystal

Zhang Wen-peng,Li Xiao-tian,Wen Zhongquan,Zhou Yi,Xiang Jin,Chen Gang,Liang Gaofeng
DOI: https://doi.org/10.1016/j.optcom.2024.131008
IF: 2.4
2024-08-27
Optics Communications
Abstract:Near-field lithography technology plays a vital role in chip manufacturing. However, near-field lithography devices with acceptable working distance (WD) have become a long-term pursuit for researchers. Here, a one-dimensional supercell photonic crystal (SPC) is proposed for near-field lithography. The simulation results show that the PCs could provide an air WD of over 100 nm in interference lithography and produce patterns with a resolution reach ∼67 nm (∼λ/6). The analyses indicate that using SPCs in interference lithography can make it more suitable for practical manufacturing. Furthermore, this type of PC can also be used in direct writing lithography. The simulation results show that the direct writing lithography could be realized with a WD of 100 nm, and the full width at half maximum of the focal spot is ∼137 nm. The principle presents a new method for controlling the evanescent waves, and the method would greatly promote the development and application of near field lithography.
optics
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