Preparation of Low Dielectric POSS/Epoxy Hybrid Polymer without Sacrificing Mechanical Performance

Pengbo Zhang,Kangle Xue,Hailong Liu,Zidie Song,Xiaoxue Sun,Tongjie Yao,Li Liu
DOI: https://doi.org/10.1039/d3nj00632h
IF: 3.3
2023-04-22
New Journal of Chemistry
Abstract:Epoxy resins were the most widely used adhesives. Nevertheless, the high dielectric constant (Dk) and dielectric loss (Df) dramatically limited their application in the fifth-generation (5G) technologies. Herein, eugenol epoxy was grafted onto the vertexes of the octasilane POSS (POSS-H) via hydrosilylation reaction, and the corresponding hollow glass microsphere (HGM) reinforced composites were prepared to simultaneously lower the Dk and Df without sacrificing mechanical properties. The obtained samples cured by methyl hexahydrophthalic anhydride exhibit low Dk (2.18) and Df (0.016) at a frequency of 10 MHz due to the low polarity and large molecular volume of the POSS-H and HGM. Moreover, the covalent bonding enables HGM to be homogeneously distributed in the network without aggregation and phase separation. The samples exhibit excellent hardness (93.5 D), tensile strength (73.9 MPa) and compressive strength (95.1 MPa). This study has significant implications for the structural design of epoxy resins used in the 5G technologies.
chemistry, multidisciplinary
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