Comparison of Sampling Techniques for the Analysis of Particulate Metal Impurities in Gases

I. Suzuki,K. Tarutani
DOI: https://doi.org/10.2116/ANALSCI.13.833
1997-10-01
Abstract:Purity requirements for the gases used in the semiconductor manufacturing process are becoming increasingly stringent as the feature sizes of electronic devices decrease. Trace level metallic contamination is one of today's concerns since such elements can create critical defects in the devices. Metal impurities in gases are typically analyzed with indirect methods by first extracting the metallic impurities from the gas into the liquid media. This liquid is subsequently analyzed by sensitive metal analyzers such as ICP-AES, ICP-MS, GF-AAS (graphite furnace atomic absorption spectrometry) or MIP-MS (microwave induced plasma mass spectrometry). The sampling of metal impurities from the gas is carried out usually by passing a gas through a sampling filter (filtration method) or by bubbling the gas in a liquid in an impinger (impinger method).12 Quantitative collection efficiency of metal impurities is usually assumed to be 100% by these sampling methods. However, this efficiency is difficult to verify because metal standards are not readily available in gas phase. In spite of such a limitation, the indirect methods have the advantage that they can be applied to a wide variety of gases, and the sampling device is portable. In recent years, attempts have been made to inject the sample gas directly into the plasma of ICP-AES3'4, ICP-MS5, MIP-AES6 or MIP-MS to determine the metal impurities in gases. However, the types of gas which can be introduced into such plasmabased analyzers are limited because of problems in plasma stability or material compatibility. Particle counting can be considered as a alternative monitoring technique for metals in particulate form in the gas stream.' Correlation, however, is not well established between the metal analysis results either by an indirect or a direct method and the particle counting results obtained for the same gas. In the present study, the sampling efficiencies of the filtration and the impinger method are compared using NaCI particles in Ar or N2 gas. NaCI particles in Ar stream were also directly introduced into the plasma of an ICP-MS to evaluate its capability for determination of particulate metal impurities in gas phase. All the above results of the metal analysis were compared with the
Chemistry,Engineering
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