UHV ARC FOR SUPERCONDUCTING NIOBIUM FILM DEPOSITION

R. Polini,Roberto Russo,J. Langner,S. Tazzari,A. Cianchi
Abstract:The coating of thin niobium film on copper RF cavities is a very interesting alternative to the bulk-Nb cavities, since copper is cheaper than niobium, has higher thermal conductivity and better mechanical stability. The technology of magnetron sputtering for coating copper cavities with superconducting thin film was successfully used for the production of 350 MHz LEP accelerating cavities at CERN. Unfortunately, the observed degradation of the quality factor with increasing cavity voltage restricts the use of sputtered accelerating cavities in future large accelerators working at gradients higher than Vacuum arc coating is known to be a powerful technique to produce films on several materials [1]. Its main advantages compared to standard sputtering are the ionized state of the evaporated material, absence of gases to sustain the discharge, high energy of the atoms reaching the substrate surface and possibility to have very high deposition rates. For the arc ignition it is necessary to produce a small plasma plume of sufficient density to form a high-conductivity path between cathode and anode. We have used for ignition a Nd-YAG pulsed laser focused on the cathode surface, which provides a reliable system and allows eliminating all possible sources of contaminants. We have proven that the arc technique produces bulk-like films suitable for superconducting applications. Its main disadvantage is the production of macroparticles that deposit on the film, can increase its roughness and may induce field emission. We present our recent results on the characterization of niobium films produced by UHV cathodic arc under different conditions, focusing mainly on the study of the macroparticle phenomenology.
Materials Science,Physics,Engineering
What problem does this paper attempt to address?