Abstract:S-parameters are widely used to detail the scattering parameters of radio frequency (RF) components and microwave circuit modules. The vector network analyzer (VNA) is the most commonly used device for measuring S-parameters. Given the multiple frequency points, complex values, and intricate uncertainty propagation involved, accurately assessing the uncertainty of S-parameter measurements is difficult. In this study, we proposed a new method for assessing S-parameter uncertainty based on the covariance matrices, tracing back to the nominal uncertainty of calibration standards. First, we analyzed the relevant theory of uncertainty assessment using covariance matrices and subsequently deduced the mechanism of Type B uncertainty propagating from calibration standards to error model coefficients and S-parameter measurements to evaluate Type B measurement uncertainty. In this study, a novel measurement system was constructed for measuring grounded coplanar waveguides by using a VNA and calibration standards with 8- and 12-error models. Initially, the model assessed the Type B uncertainty of measuring four S-parameters of a grounded coplanar waveguide. Next, the VNA calibrated with the 12-error model was used to conduct multiple repeated measurements to assess the Type A uncertainty of the grounded coplanar waveguide. Finally, the composite uncertainty was constructed, which demonstrated that the proposed method can be used for assessing the uncertainty of S-parameters.

A bilateral comparison of on-wafer S-parameter measurements at millimeter wavelengths

A Novel Four-Port Symmetric Probe Calibration Method for On-Wafer S-Parameter Measurement

Comparison of On-Wafer TRL Calibration to ISS SOLT Calibration With Open-Short De-Embedding up to 500 GHz

An Inter-Laboratory Comparison of NVNA Measurements

A Novel Four-Port Calibration Method for High Frequency On-Wafer S-parameter Measurement

Material Measurements Using VNA-Based Material Characterization Kits Subject to Thru-Reflect-Line Calibration

A New SOLT Calibration Method for Leaky On-Wafer Measurements Using a 10-Term Error Model

A New Calibration Technique of Electromagnetic Simulators for Accurate Analyses of Microwave Components on Epitaxial Wafers

Long-wave infrared 1 × 2 MMI based on air-gap beneath silicon rib waveguides.

Calibrations for Millimeter-Wave Silicon Transistor Characterization

Scattering Parameter Measurements of the Long Wavelength Array Antenna and Front End Electronics

Measurements of Planar Microwave Circuits Using an Improved Trl Calibration Method

Multi-kilowatt cw laser power measurement comparison between national standards

Calibrated and Frequency Traceable D-Band FMCW Radar for VNA-like S-Parameter Measurements

Measuring the permittivity of fused silica with planar on-wafer structures up to 325 GHz

Assessment of Measurement Uncertainty for S-Parameter Measurement Based on Covariance Matrix

A potentially significant on-wafer high-frequency measurement calibration error

Comparison Among Coaxial Microcalorimeter Models

Optical and geometric parameter extraction across 300-mm photonic integrated circuit wafers