Abstract:Hybrid high-power impulse and dc magnetron co-sputtering (HiPIMS/DCMS) with substrate bias synchronized to the high mass metal-ion fluxes was previously proposed as a solution to reduce energy consumption during physical vapor deposition processing and enable coatings on temperature-sensitive substrates. In this approach, no substrate heating is used (substrate temperature is lower than 150 o C) and the thermally activated adatom mobility, necessary to grow dense films, is substituted by overlapping collision cascades induced by heavy ion bombardment and consisting predominantly of low-energy recoils. Here, we present direct evidence for the crucial role of W + ion irradiation in the densification of Ti 0.31 Al 0.60 W 0.09 N films grown by the hybrid W-HiPIMS/TiAl-DCMS co-sputtering. The peak target current density J max on the W target is varied from 0.06 to 0.78 A/cm 2 resulting in more than fivefold increase in the number of W + ions per deposited metal atom, η = W + /(W + Al + Ti) determined by time-resolved ion mass spectrometry analyses performed at the substrate plane under conditions identical to those during film growth. The DCMS is adjusted appropriately to maintain the W content in the films constant at Ti 0.31 Al 0.60 W 0.09 N. The degree of porosity, assessed qualitatively from cross-sectional SEM images and quantitatively from oxygen concentration profiles as well as nanoindentation hardness, is a strong function of η(Jmax) . Layers grown with low η values are porous and soft, while those deposited under conditions of high η are dense and hard. Nanoindentation hardness of Ti 0.31 Al 0.60 W 0.09 N films with the highest density is ∼33 GPa, which is very similar to values reported for layers deposited at much higher temperatures (420–500 o C) by conventional metal-ion-based techniques. These results prove that the hybrid HiPIMS/DCMS co-sputtering with bias pulses synchronized to high mass metal ion irradiation can be successfully used to replace conventional solutions. The large energy losses associated with heating of the entire vacuum chamber are avoided, by focusing the energy input to where it is in fact needed, i.e., the workpiece to be coated.

Superhard oxidation-resistant Ti1-xAlxBy thin films grown by hybrid HiPIMS/DCMS co-sputtering diboride targets without external substrate heating

Morphology, mechanical properties, and oxidation behavior of stoichiometric Ti0.33-xAlxB0.67 coatings (x = 0.04, 0.15, 0.21, and 0.28)

Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films

Effect of Al content on the hardness and thermal stability study of AlTiN and AlTiBN coatings deposited by HiPIMS

Structure, mechanical and thermal properties of Ti1−x−y−zAlxTayBzN coatings

The Mechanical Properties of Intermetallic Ni50−xTi50Alx Alloys (X=6,7,8,9)

The oxidation behaviors of TiB1.73, Al0.59Ti0.41N, and TiB1.73/Al0.59Ti0.41N coatings deposited by high-power impulse magnetron sputtering method

Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumption

Effect of TiB2 on Microstructure, Mechanical Properties and Oxidation Resistance of TiAl-based Alloys

Improved High-Temperature Oxidation Properties for Mn-Containing Beta-Gamma TiAl with W Addition

High-power impulse magnetron sputter deposition of TiB x thin films: Effects of pulse length and peak current density

Insights into the Role of W/B Alloying on High-Temperature Oxidation Behavior of Ti42Al5Mn Alloy

Structure, mechanical and thermal properties of TiAlBN/TiAlN multilayers

Effects of titanium and boron alloying with non-equimolar AlCrNbSiTi high entropy alloy nitride coatings

Microstructure and Mechanical Properties of Co-Deposited Ti-Ni Films Prepared by Magnetron Sputtering

Effects of Mo target power on the structure and tribological properties of AlB2 Ta1-xMoxB films by magnetron sputtering

Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heating

The new Iridium-Hafnium-Aluminum alloy thin films with excellent mechanical properties and oxidation resistance

Structure evolution and mechanical properties of Al-alloyed tantalum diboride films prepared by magnetron sputtering co-deposition

Effect of titanium and deposition parameters on microstructure and mechanical properties of W-Ti-B thin films deposited by High Power Impulse Magnetron Sputtering

Effects of Boron Content on Microstructure and Mechanical Properties of TiAlSiBxN Nanocomposite Films