Abstract:Quantum bits (qubits) with long coherence times are an important element for the implementation of medium- and large-scale quantum computers. In the case of superconducting planar qubits, understanding and improving qubits' quality can be achieved by studying superconducting planar resonators. In this Paper, we fabricate and characterize coplanar waveguide resonators made from aluminum thin films deposited on silicon substrates. We perform three different substrate treatments prior to aluminum deposition: One chemical treatment based on a hydrofluoric acid clean, one physical treatment consisting of a thermal annealing at 880 degree Celsius in high vacuum, one combined treatment comprising both the chemical and the physical treatments. We first characterize the fabricated samples through cross-sectional tunneling electron microscopy acquiring electron energy loss spectroscopy maps of the samples' cross sections. These measurements show that both the chemical and the physical treatments almost entirely remove native silicon oxide from the substrate surface and that their combination results in the cleanest interface. We then study the quality of the resonators by means of microwave measurements in the "quantum regime", i.e., at a temperature T~10 mK and at a mean microwave photon number $\langle n_{\textrm{ph}} \rangle \sim 1$. In this regime, we find that both surface treatments independently improve the resonator's intrinsic quality factor and that the highest quality factor is obtained for the combined treatment, $Q_{\textrm{i}} \sim 0.8$ million. Finally, we find that the TLS quality factor averaged over a time period of 3 h is $\sim 3$ million at $\langle n_{\textrm{ph}} \rangle \sim 10$, indicating that substrate surface engineering can potentially reduce the TLS loss below other losses such as quasiparticle and vortex loss.

Measuring the role of surface chemistry in silicon microphotonics

Surface Encapsulation for Low-Loss Silicon Photonics

First-Principles Study on the Surface Chemistry of 1.4 Nm Silicon Nanocrystals: Case of Hydrosilylation

Fluorine-Passivated Silicon Nanocrystals: Surface Chemistry Versus Quantum Confinement

Post-Processing Trimming of Silicon Photonic Devices Using Femtosecond Laser.

Probing the loss origins of ultra-smooth $\mathrm{Si_3N_4}$ integrated photonic waveguides

Quantifying and mitigating optical surface loss in suspended GaAs photonic integrated circuits

Sub-ppm Nanomechanical Absorption Spectroscopy of Silicon Nitride

Characterization of process-related interfacial dielectric loss in aluminum-on-silicon by resonator microwave measurements, materials analysis, and imaging

Dispersion engineering of high-Q silicon microresonators via thermal oxidation

Investigation of Q degradation in low-loss Si3N4 from heterogeneous laser integration

Modifying single-crystal silicon and trimming silicon microring devices by femtosecond laser irradiation

A Study on the Surface Quality and Damage Properties of Single-Crystal Silicon Using Different Post-Treatment Processes

Low-Loss Silicon Platform for Broadband Mid-Infrared Photonics

Permanent mitigation of loss in ultrathin SOI high-Q resonators using UV light

Amorphous silicon-doped titania films for on-chip photonics

Towards Investigating Surface Quality of Single-Crystal Silicon Optics Polished with Different Processes

Probing material absorption and optical nonlinearity of integrated photonic materials

Substrate surface engineering for high-quality silicon/aluminum superconducting resonators

Wet-Oxidation-Assisted Chemical Mechanical Polishing and High-Temperature Thermal Annealing for Low-Loss 4H-SiC Integrated Photonic Devices

Schottky Barrier Modulation in Surface Nanoroughened Silicon Nanomembranes for High-Performance Optoelectronics.