Amorphous silicon-doped titania films for on-chip photonics

Thomas Kornher,Kangwei Xia,Roman Kolesov,Bruno Villa,Stefan Lasse,Cosmin S. Sandu,Estelle Wagner,Scott Harada,Giacomo Benvenuti,Hans-Werner Becker,Jörg Wrachtrup

DOI: https://doi.org/10.48550/arXiv.1702.03544

2017-02-13

Abstract:High quality optical thin film materials form a basis for on-chip photonic micro- and nano-devices, where several photonic elements form an optical circuit. Their realization generally requires the thin film to have a higher refractive index than the substrate material. Here, we demonstrate a method of depositing amorphous 25% Si doped TiO2 films on various substrates, a way of shaping these films into photonic elements, such as optical waveguides and resonators, and finally, the performance of these elements. The quality of the film is estimated by measuring thin film cavity Q-factors in excess of 10^5 at a wavelength of 790 nm, corresponding to low propagation losses of 5.1 db/cm. The fabricated photonic structures were used to optically address chromium ions embedded in the substrate by evanescent coupling, therefore enabling it through film-substrate interaction. Additional functionalization of the films by doping with optically active rare-earth ions such as erbium is also demonstrated. Thus, Si:TiO2 films allow for creation of high quality photonic elements, both passive and active and also provide access to a broad range of substrates and emitters embedded therein.

Mesoscale and Nanoscale Physics,Optics

What problem does this paper attempt to address?

The problem that this paper attempts to solve is to develop an efficient and high - quality optical thin - film material to realize the application of on - chip photonic micro - and nano - devices. Specifically, the researchers hope to fabricate high - performance optical waveguides and optical resonators by depositing silicon - doped titanium dioxide (Si:TiO₂) films, and use these structures to couple with the luminescence centers embedded in the substrate materials.

### Main problems

1. **Preparation of high - refractive - index films**:
- Transparent films with high refractive index need to be deposited on different substrate materials (such as glass, sapphire, YAG, etc.) to support the optical waveguide function.
- Traditional methods such as femtosecond laser direct writing have the problem of low refractive - index contrast, which leads to an increase in the minimum feature size and is not suitable for cavity quantum electrodynamics (CQED) and nanophotonics.

2. **Quality and stability of films**:
- Traditional TiO₂ films are prone to form nanocrystals at high temperatures, resulting in significant scattering and optical losses.
- Researchers need to find a method to maintain the amorphous state of the film, thereby reducing scattering and improving optical performance.

3. **Functional integration**:
- Realize the integration of the film with other photonic elements, for example, by introducing fluorescent rare - earth ions (such as erbium ions) to endow the film with additional functions, making it work not only as a passive element but also as an active element.

### Solutions

- **Chemical beam vapor deposition (CBVD) technology**: Deposit Si:TiO₂ films by CBVD technology and maintain their amorphous state, thereby reducing scattering and improving optical quality.
- **Optimized film properties**: By doping silicon, the refractive index of the film is between 2.1 and 2.3, which is suitable for most transparent substrate materials.
- **Structuring process**: Use reactive - ion etching (RIE) technology to process the film into photonic elements such as optical waveguides and microring resonators.
- **Functionalization**: By doping fluorescent rare - earth ions (such as erbium ions), the film has additional functions, such as up - conversion fluorescence.

### Results

- The prepared Si:TiO₂ films exhibit low propagation losses (5.1 dB/cm) and high Q - factors (exceeding 10⁵), indicating their excellent optical performance.
- The evanescent - field coupling with chromium ions embedded in the substrate material has been successfully achieved, verifying the feasibility of the film - substrate interaction.
- After doping erbium ions, the film shows strong up - conversion fluorescence, further proving its potential as an active element.

In summary, this research provides high - quality film materials and preparation processes for on - chip photonics, solves the problems existing in traditional methods, and shows its great potential in CQED and other photonic applications.