Van der Waals Epitaxy of Weyl-Semimetal T d -WTe 2
Alexandre Llopez,Frédéric Leroy,Calvin Tagne-Kaegom,Boris Croes,Adrien Michon,Chiara Mastropasqua,Mohamed Al Khalfioui,Stefano Curiotto,Pierre Müller,Andrés Saùl,Bertrand Kierren,Geoffroy Kremer,Patrick Le Fèvre,François Bertran,Yannick Fagot-Revurat,Fabien Cheynis,Frédéric Leroy,Pierre Müller,Andrés Saùl,Patrick Le Fèvre,François Bertran
DOI: https://doi.org/10.1021/acsami.4c00676
IF: 9.5
2024-04-11
ACS Applied Materials & Interfaces
Abstract:Epitaxial growth of WTe(2) offers significant advantages, including the production of high-quality films, possible long-range in-plane ordering, and precise control over layer thicknesses. However, the mean island size of WTe(2) grown by molecular beam epitaxy (MBE) in the literature is only a few tens of nanometers, which is not suitable for the implementation of devices at large lateral scales. Here we report the growth of T(d) -WTe(2) ultrathin films by MBE on monolayer (ML) graphene,...
materials science, multidisciplinary,nanoscience & nanotechnology