Van der Waals epitaxial growth of few layers WSe2 on GaP(111)B

Niels Chapuis,Aymen Mahmoudi,Christophe Coinon,David Troadec,Dominique Vignaud,Gilles Patriarche,Pascal Roussel,Abdelkarim Ouerghi,Fabrice Oehler,Xavier Wallart
DOI: https://doi.org/10.1088/2053-1583/ad573a
IF: 6.861
2024-06-14
2D Materials
Abstract:2D material epitaxy offers the promise of new 2D/2D and 2D/3D heterostructures with their own specific electronic and optical properties. In this work, we demonstrate the epitaxial growth of few layers WSe2on GaP(111)Bby molecular beam epitaxy. Using a combination of experimental techniques, we emphasize the role of the growth temperature and of a subsequent annealing of the grown layers under a selenium flux on the polytype formed and on its structural and morphological properties. We show that a low growth temperature promotes the formation of the 1T' and 3R phases depending on the layer thickness whereas a higher growth temperature favours the stable 2H phase. The resulting layers exhibit clear epitaxial relationships with the GaP(111)B substrate with an optimum grain disorientation and mean size of 1.1° and around 30 nm respectively for the 2H phase. Bilayer 2H WSe2/GaP(111)B heterostructures exhibit astaggered type II band alignment and p-doped character of the epi-layer on both p and n-typeGaP substrates. This first realisation of stable p-type WSe2 epi-layer on a large-area GaP(111)B substrate paves the way to new 2D/3D heterostructures with great interests in nanoelectronic and optoelectronic applications, especially in the development of new 2D-material p-n junctions.
materials science, multidisciplinary
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