Formation of an extended defect cluster in cuprous oxide

Garima Aggarwal,Sushobhita Chawla,Akhilender Jeet Singh,Nawaf Alampara,Dayadeep S Monder,K R Balasubramaniam
DOI: https://doi.org/10.1088/1361-6463/ad4a82
2024-05-15
Journal of Physics D Applied Physics
Abstract:Intrinsic defects and defect clusters play an important role in the room-temperature transport of cuprous oxide. Neutralization of these defects by doping and/or modifying the synthesis process is essential to improve the room temperature (RT) hole mobility in cuprous oxide. Towards this, we annealed polycrystalline cuprous oxide under Cu-rich conditions leading to neutralization of the intrinsic acceptor defect. The concentration of both the acceptor defects (V Cu and V split Cu ) that are already present, reduces by four to five orders of magnitude. This is commensurate with the amount of possible Cu incorporation under different annealing conditions, indicating the back-filling of a large fraction of the Cu vacancies. Unforeseeably, the experimental conditions lead to the creation of yet another higher order extended defect (3V Cu + 2Cu i ) with a defect level at ≈0.5 eV above the valence band. The formation of such a defect is also indirectly suggested by the analysis of carrier concentration vs. temperature data and first principle calculations. Such singly ionized higher order defects with a possibly higher capture cross-section act as more effective traps resulting in reduced hole mobility.
physics, applied
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