An epsilon-near-zero-based Dallenbach absorber

Viacheslav V. Medvedev
DOI: https://doi.org/10.1016/j.optmat.2021.111899
IF: 3.754
2022-01-01
Optical Materials
Abstract:We report a theoretical analysis of total absorption conditions in a structure consisting of a lossy coating layer on top of a metal substrate, which is known as a Dallenbach absorber. All possible combinations of complex refractive indices of the coating material and thicknesses of the coating layer providing complete absorption are described for the case of normal incidence of a plane wave. The resulting solution space allows Dallenbach absorbers to be designed both with the use of conventional lossy dielectric or semiconductor materials having a refractive index greater than unity and with the use of epsilon-near-zero (ENZ) materials. Simple analytical relations are obtained for the total absorption conditions in ENZ materials. For coatings with different values of the refractive index, we present a comparative analysis of the angular dependences of the absorption coefficient and the profiles of the electromagnetic field distribution. The design of an indium-tin oxide (ITO) coating on an aluminum substrate is presented by the example of an ENZ-based Dallenbach absorber. It is shown that by varying the concentration of free carriers in ITO in the range 1019 − 1021 cm−3, the total absorption can be achieved at any wavelength in the range of approximately 1–10 μm.
materials science, multidisciplinary,optics
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