Abstract:Optical absorbers find uses in a wide array of applications across the electromagnetic spectrum, including photovoltaic and photochemical cells, photodetectors, optical filters, stealth technology, and thermal light sources. Recent efforts have sought to reduce the footprint of optical absorbers, conventionally based on graded structures or Fabry‐Perot‐type cavities, by using emerging concepts in plasmonics, metamaterials, and metasurfaces. Unfortunately, these new absorber designs require patterning on subwavelength length scales, and are therefore impractical for many large‐scale optical and optoelectronic devices. In this article, we summarize recent progress in the development of optical absorbers based on lossy films with thicknesses significantly smaller than the incident optical wavelength. These structures have a small footprint and require no nanoscale patterning. We outline the theoretical foundation of these absorbers based on “ultra‐thin‐film interference”, including the concepts of loss‐induced phase shifts and critical coupling, and then review several applications, including ultra‐thin color coatings, decorative photovoltaics, high‐efficiency photochemical cells, and infrared scene generators. Ultra‐thin optical absorbers are desired for many applications across the electromagnetic spectrum, including solar energy harvesting, photodetectors, optical filters, stealth technology, and thermal light sources. This review summarizes recent progress in the development of optical absorbers based on lossy films with thicknesses significantly smaller than the incident optical wavelength. The basic theory governing ultra‐thin‐film absorbers is discussed, along with application examples, including color coatings, decorative photovoltaics, photochemical cells, and infrared scene generators.

Epsilon-Near-Zero Substrate Engineering for Ultrathin-Film Perfect Absorbers

Omnidirectional, Thin Metasurface Exhibiting Selective Absorption for Un-Polarized Broadband Incidence

Compact Multilayer Film Structures for Ultrabroadband, Omnidirectional, and Efficient Absorption

Berreman type perfect absorber based on epsilon near zero material gallium doped zinc oxide

Integrating Two Epsilon-Near-zero Materials into Planar Multilayer Metamaterial Structure for Broadband Near-Perfect Mid-IR Absorption

Epsilon-near-zero thin-film metamaterials for wideband near-perfect light absorption

Polarization-Independent, tunable, broadband perfect absorber based on semi-sphere patterned Epsilon-Near-Zero films

Super broadband mid-infrared absorbers with ultrathin folded highly-lossy films

Design of Multilayer Planar Film Structures for Near-Perfect Absorption in the Visible to Near-Infrared.

Large-Area Low-Cost Dielectric Perfect Absorber by One-Step Sputtering

Optical absorbers based on strong interference in ultra‐thin films

An epsilon-near-zero-based Dallenbach absorber

Perfect Absorption in Ultrathin Epsilon-Near-Zero Metamaterials Induced by Fast-Wave Non-Radiative Modes

Ultrathin High Quality-Factor Planar Absorbers/Emitters Based on Uniaxial/Biaxial Anisotropic van der Waals Polar Crystals

Photonic-doped Epsilon-Near-zero Media for Coherent Perfect Absorption

Perfect Absorption at the Ultimate Thickness Limit in Planar Films

Angle-selective perfect absorption with two-dimensional materials

Permittivity Acquisition Of Plasmonic Materials At Epsilon Near Zero Wavelengths

Near‐Infrared Super‐Absorbing All‐Dielectric Metasurface Based on Single‐Layer Germanium Nanostructures

Perfect Absorber Based on Epsilon-Near-Zero Metamaterial as a Refractive Index Sensor

Inverse-Designed Broadband Ultrathin Aperiodic Metacoatings Spanning from Deep Ultraviolet to Near Infrared