High dielectric temperature stability in the relaxor ferroelectric thin films via using a multilayer heterostructure

Jie Zhang,Xiaoyang Chen,MingJian Ding,Jiaqiang Chen,Ping Yu
DOI: https://doi.org/10.1016/j.scriptamat.2023.115895
IF: 6.302
2023-11-30
Scripta Materialia
Abstract:The temperature stability of the relaxor ferroelectrics ( RFE s) mainly originates from the diffuse phase transition ( DPT ). Higher atomic disorder degrees, more inhomogeneous lattice distortion and polymorphic phases could increase the compositional inhomogeneity for a stronger DPT . This work aims to enhance this compositional inhomogeneity for a high dielectric temperature stability by preparing the multicomponent RFE -based multilayer heterostructure polycrystalline thin films. The as-prepared RFE thin films show a relatively high dielectric constant (∼165.14), and a very high dielectric temperature stability with a very low relative variation ratio of dielectric constant (∼1.7 %) from -55 °C to 150 °C which can be comparable to most linear dielectric thin films. Meanwhile, the dielectric loss and leakage current densities were also optimized. This work brings the potential application of the RFE thin films in the thin-film capacitor with high temperature stability requirements.
materials science, multidisciplinary,nanoscience & nanotechnology,metallurgy & metallurgical engineering
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