Optimized Cryo-CMOS Technology with VTH<0.2V and Ion>1.2mA/um for High-Peformance Computing

Chang He,Yue Xin,Longfei Yang,Zewei Wang,Zhidong Tang,Xin Luo,Renhe Chen,Zirui Wang,Shuai Kong,Jianli Wang,Jianshi Tang,Xiaoxu Kang,Shoumian Chen,Yuhang Zhao,Shaojian Hu,Xufeng Kou
2024-11-05
Abstract:We report the design-technology co-optimization (DTCO) scheme to develop a 28-nm cryogenic CMOS (Cryo-CMOS) technology for high-performance computing (HPC). The precise adjustment of halo implants manages to compensate the threshold voltage (VTH) shift at low temperatures. The optimized NMOS and PMOS transistors, featured by VTH<0.2V, sub-threshold swing (SS)<30 mV/dec, and on-state current (Ion)>1.2mA/um at 77K, warrant a reliable sub-0.6V operation. Moreover, the enhanced driving strength of Cryo-CMOS inherited from a higher transconductance leads to marked improvements in elevating the ring oscillator frequency by 20%, while reducing the power consumption of the compute-intensive cryogenic IC system by 37% at 77K.
Systems and Control
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