Abstract:Here, the key mechanisms and diverse applications of controlled voltage‐assisted chemical etching (ECE) and metal‐assisted chemical etching (MaCE) of silicon, spanning both micro and nanoscale dimensions, are reviewed. This review offers a distinctive understanding of ECE and MaCE technologies, highlighting the most recent achievements, and discussing their future perspectives in silicon micro and nano machining. Sculpting silicon at the micro and nano scales has been game‐changing to mold bulk silicon properties and expand, in turn, applications of silicon beyond electronics, namely, in photonics, sensing, medicine, and mechanics, to cite a few. Voltage‐ and metal‐assisted chemical etching (ECE and MaCE, respectively) of silicon in acidic electrolytes have emerged over other micro and nanostructuring technologies thanks to their unique etching features. ECE and MaCE have enabled the fabrication of novel structures and devices not achievable otherwise, complementing those feasible with the deep reactive ion etching (DRIE) technology, the gold standard in silicon machining. Here, a comprehensive review of ECE and MaCE for silicon micro and nano machining is provided. The chemistry and physics ruling the dissolution of silicon are dissected and similarities and differences between ECE and MaCE are discussed showing that they are the two sides of the same coin. The processes governing the anisotropic etching of designed silicon micro and nanostructures are analyzed, and the modulation of etching profile over depth is discussed. The preparation of micro‐ and nanostructures with tailored optical, mechanical, and thermo(electrical) properties is then addressed, and their applications in photonics, (bio)sensing, (nano)medicine, and micromechanical systems are surveyed. Eventually, ECE and MaCE are benchmarked against DRIE, and future perspectives are highlighted.

Lift-off free catalyst for metal assisted chemical etching of silicon in vapour phase

Isotropic Etch for SiO2 Microcantilever Release with ICP System

MoS2-assisted chemical etching of silicon in an HF/H2O vapor

Uniform Vertical Trench Etching on Silicon with High Aspect Ratio by Metal-Assisted Chemical Etching Using Nanoporous Catalysts.

Effect of Isopropanol on Gold Assisted Chemical Etching of Silicon Microstructures

Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching

Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching

Metal Ions' Dynamic Effect on Metal-Assisted Catalyzed Etching of Silicon in Acid Solution

A single layer hydrogen silsesquioxane (HSQ) based lift-off process for germanium and platinum

Atmospheric Gas-Phase Catalyst Etching of SiO 2 for Deep Microfabrication Using HF Gas and Patterned Photoresist

Bi-Layer Nanoimprinting Lithography for Metal-Assisted Chemical Etching with Application on Silicon Mold Replication

Optimization of Metal-Assisted Etchant Components for Fabrication of Porous Silicon

Voltage‐ and Metal‐assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review

Modified Si Oxidation Behavior by Ultrathin Ni Catalyst Enabling Oxidant‐Less Metal‐Assisted Chemical Etching

Chemical etching optimization of 3D printed α-Al 2 O 3 monoliths to enhance the catalytic applications

Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers

Bio-Inspired Hierarchical Micro-/Nanostructures for Anti-Icing Solely Fabricated by Metal-Assisted Chemical Etching.

Selenic Acid Etching Assisted Atomic Engineering for Designing Metal-Semimetal Dual Single-Atom Catalysts for Enhanced CO 2 Electroreduction

Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition

Development of a Selective Wet-Chemical Etchant for 3D Structuring of Silicon via Nonlinear Laser Lithography

Uniform Metal-Assisted Chemical Etching for Ultra-High-Aspect-Ratio Microstructures on Silicon