Abstract:Lithium niobate (LN) is used in diverse applications such as spectroscopy, remote sensing, and quantum communications. The emergence of lithium-niobate-on-insulator (LNOI) technology and its commercial accessibility represent significant milestones. This technology aids in harnessing the full potential of LN's properties, such as achieving tight mode confinement and strong overlap with applied electric fields, which has enabled LNOI-based electro-optic modulators to have ultra-broad bandwidths with low-voltage operation and low power consumption. Consequently, LNOI devices are emerging as competitive contenders in the integrated photonics landscape. However, the nanofabrication, particularly LN etching, presents a notable challenge. LN is hard, dense, and chemically inert. It has anisotropic etch behavior and a propensity to produce material redeposition during the reactive-ion plasma etch process. These factors make fabricating low-loss LNOI waveguides (WGs) challenging. Recognizing the pivotal role of addressing these fabrication challenges for obtaining low-loss WGs, our research focuses on a systematic study of various process steps in fabricating LNOI WGs and other photonic structures. In particular, our study involves (i) careful selection of hard mask materials, (ii) optimization of inductively coupled plasma etch parameters, and finally, (iii) determining the optimal post-etch cleaning approach to remove redeposited material on the sidewalls of the etched photonic structures. Using the recipe established, we realized optical WGs with total (propagation and coupling) loss value of -10.5 dB, comparable to established values found in the literature. Our findings broaden our understanding of optimizing fabrication processes for low-loss lithium-niobate waveguides and can serve as an accessible resource in advancing LNOI technology.

Avoiding lateral mode leakage in thin film lithium niobate waveguides for the generation of spectrally pure photons at telecom wavelengths

Polarization-independent Photon Up-Conversion with a Single Lithium Niobate Waveguide

Singly poled thin film lithium niobate waveguide as a tunable source of photon pairs across telecom band

Efficient photon-pair generation in layer-poled lithium niobate nanophotonic waveguides

Ultra-low loss photonic circuits in Lithium Niobate On Insulator

Optimization of waveguide fabrication processes in lithium-niobate-on-insulator platform

Group index matched frequency conversion in lithium niobate on insulator waveguides

Efficient generation of broadband photon pairs in shallow-etched lithium niobate nanowaveguide

The impact of lateral leakage on the nonlinear optical waveguide design in lithium niobate on insulator (LNOI)

Improved second harmonic performance in periodically poled LNOI waveguides through engineering of lateral leakage

Enhanced Nonlinearity in Lithium Niobate on Insulator (LNOI) Waveguides Through Engineering of Lateral Leakage

Hybrid Lithium Niobate and Silicon Photonic Waveguides

Elimination of the fundamental mode hybridization on an x-cut lithium-niobate-on-insulator by using a densely packed bent waveguide array

Efficient Poling‐Free Wavelength Conversion in Thin Film Lithium Niobate Harnessing Bound States in the Continuum

Heterogeneous Integration of Lithium Niobate and Silicon Nitride Waveguides for Wafer-Scale Photonic Integrated Circuits on Silicon.

Generation of narrowband counterpropagating polarization-entangled photon pairs based on thin-film lithium niobate on insulator

Channel Waveguides in Lithium Niobate and Lithium Tantalate

Efficient Second Harmonic Generation in Lithium Niobate on Insulator Waveguides and Its Pitfalls

Fabrication of low-loss lithium niobate on insulator waveguides on the wafer scale

Second harmonic generation in nano-structured thin-film lithium niobate waveguides

Fabrication of low‐loss symmetrical rib waveguides based on x ‐cut lithium niobate on insulator for integrated quantum photonics