Abstract:The primary requirement for the development of tools for extreme ultraviolet lithography (EUVL) has been the identification and optimization of suitable sources. These sources must be capable of producing hundreds of watts of extreme ultraviolet (EUV) radiation within a wavelength bandwidth of 2% centred on 13.5 nm, based on the availability of Mo/Si multilayer mirrors (MLMs) with a reflectivity of similar to 70% at this wavelength. Since, with the exception of large scale facilities, such as free electron lasers, such radiation is only emitted from plasmas containing moderately to highly charged ions, the source development prompted a large volume of studies of laser produced and discharge plasmas in order to identify which ions were the strongest emitters at this wavelength and the plasma conditions under which their emission was optimized. It quickly emerged that transitions of the type 4p(6)4d(n) - 4p(5)4d(n+1) + 4d(n-1)4f in the spectra of Sn IX to SnXIV were the best candidates and work is still ongoing to establish the plasma conditions under which their emission at 13.5 nm is maximized. In addition, development of other sources at 6.X nm, where X similar to 0.7, has been identified as the wavelength of choice for so-called Beyond EUVL (BEUVL), based on the availability of La/B based MLMs, with theoretical reflectance approaching 80% at this wavelength. Laser produced plasmas of Gd and Tb have been identified as potential source elements, as n = 4 - n = 4 transitions in their ions emit strongly near this wavelength. However to date, the highest conversion efficiency (CE) obtained, for laser to BEUV energy emitted within the 0.6% wavelength bandwidth of the available mirrors is only 0.8%, compared with values of 5% for the 2% bandwidth relevant for the Mo/Si mirrors at 13.5 nm. This suggests a need to identify other potential sources or the selection of other wavelengths for BEUVL. This review deals with the atomic physics of the highly-charged ions relevant to EUV emission at these wavelengths. It considers the developments that have contributed to the realization of the 5% CE at 13.5 nm which underpins the production of high-volume lithography tools, and those that will be required to realize BEUV lithography.

Evaluation of X-ray/EUV Nanolithography Facility at AS Through Wavefront Propagation Simulations

Evaluation of the X‐ray/EUV Nanolithography Facility at AS through wavefront propagation simulations

Generation and use of coherent x-ray beams at future SKIF storage ring

X-ray microscopy instrumentation developments at NSLS-II: recent progress and future directions

Sources for Beyond Extreme Ultraviolet Lithography and Water Window Imaging

Simulation of High-Resolution X-ray Microscopic Images for Improved Alignment

Evaluation and Simulations of A Thomson Scattering X-Ray Source Based on Ray Tracing Methods

Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development

Performance of the undulator based ultraviolet and soft x-ray beamline for catalysis and surface science at National Synchrotron Radiation Laboratory

Efficient end‐to‐end simulation of time‐dependent coherent X‐ray scattering experiments

X‐ray optics for the cavity‐based X‐ray free‐electron laser

Lab-scale soft x-ray ptychography: advanced nanoscale imaging and beam diagnostics

HYBRID method simulations of a soft X-ray beamline

A Laboratory-based Hard X-ray Monochromator for High-Resolution X-ray Emission Spectroscopy and X-ray Absorption Near Edge Structure Measurements

Towards performing high-resolution inelastic X-ray scattering measurements at hard X-ray free-electron lasers coupled with energetic laser drivers

Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy

Angular resolution measurements at SPring-8 of a hard X-ray optic for the New Hard X-ray Mission

High-resolution soft X-ray emission spectrograph at advanced light source

New evaluation beamline for soft x-ray optical elements

High-NA EUV lithography: current status and outlook for the future

Quantitative Agreement Between Dynamical Rocking Curves in Ultrafast Electron Diffraction for X-Ray Lasers.