Millimeter-scale exfoliation of hBN with tunable flake thickness

Amy S. McKeown-Green,Helen J. Zeng,Ashley P. Saunders,Jiayi Li,Jenny Hu,Jiaojian Shi,Yuejun Shen,Feng Pan,Jennifer A. Dionne,Tony F. Heinz,Stephen Wu,Fan Zheng,Fang Liu

2023-11-03

Abstract:As a two-dimensional (2D) dielectric material, hexagonal boron nitride (hBN) is in high demand for applications in photonics, nonlinear optics, and nanoelectronics. Unfortunately, the high-throughput preparation of macroscopic-scale, high-quality hBN flakes with controlled thickness is an ongoing challenge, limiting device fabrication and technological integration. Here, we present a metal thin-film exfoliation method to prepare hBN flakes with millimeter-scale dimension, near-unity yields, and tunable flake thickness distribution from 1-7 layers, a substantial improvement over scotch tape exfoliation. The single crystallinity and high quality of the exfoliated hBN are demonstrated with optical microscopy, atomic force microscopy, Raman spectroscopy, and second harmonic generation. We further explore a possible mechanism for the effectiveness and selectivity based on thin-film residual stress measurements, density functional theory calculations, and transmission electron microscopy imaging of the deposited metal films. We find that the magnitude of the residual tensile stress induced by thin film deposition plays a key role in determining exfoliated flake thickness in a manner which closely resembles 3D semiconductor spalling. Lastly, we demonstrate that our exfoliated, large-area hBN flakes can be readily incorporated as encapsulating layers for other 2D monolayers. Altogether, this method brings us one step closer to the high throughput, mass production of hBN-based 2D photonic, optoelectronic, and quantum devices.

Materials Science,Mesoscale and Nanoscale Physics,Optics

What problem does this paper attempt to address?

The problem this paper attempts to address is the development of an efficient and controllable method for preparing large-area, high-quality, and thickness-tunable hexagonal boron nitride (hBN) sheets. Specifically, the paper aims to overcome the issues of small size, uncontrollable thickness, and low yield present in traditional methods (such as the tape exfoliation method). By using a metal film-assisted exfoliation technique, the researchers achieved the preparation of millimeter-sized hBN sheets and were able to precisely control the thickness distribution of the sheets (from a single layer to 7 layers). This method not only improves the yield but also ensures the high crystalline quality and optical quality of the resulting hBN sheets, making it possible for large-scale production of 2D photonic, optoelectronic, and quantum devices based on hBN. Additionally, the paper explores the mechanism behind this method, finding that the residual stress generated during the deposition process is the key factor determining the thickness of the exfoliated sheets.