Abstract:Mechanical strain is a powerful tool to tune the optical and optoelectronic properties of atomically thin semiconductors. Inhomogeneous strain plays an important role in exciton funneling and the activation of single-photon emitters in 2D materials. Here, we create an inhomogeneous strain profile in a 2D semiconductor on a micrometer scale by a nanoimprint process. We present a nanoimprint setup, where a mold is used to apply pressure in a controlled way to a WS2 monolayer on a heated polymer layer. After printing, the strain created in the 2D semiconductor is verified by hyperspectral optical imaging. The developed nanoimprint technique is scalable and could be transferred to commercial nanoimprint machines.

What problem does this paper attempt to address?

The problem that this paper attempts to solve is how to create an inhomogeneous strain distribution in two - dimensional semiconductor materials. Specifically, the authors have developed a nano - imprinting technique that can apply inhomogeneous strain to monolayer WS₂ on a micrometer scale, thereby modulating its optical and photoelectric properties. ### Background and Motivation 1. **Importance of Strain Engineering** - Mechanical strain is a powerful tool for tuning the optical and photoelectric properties of atomically - thin semiconductors. - Inhomogeneous strain plays an important role in the exciton funneling effect and in activating single - photon emitters. 2. **Limitations of Existing Methods** - Traditional tensile and bending test methods face challenges when dealing with two - dimensional materials at the nanoscale. - Existing strain - induction methods usually require complex pre - treatment or direct manipulation of two - dimensional materials, lack sufficient controllability and repeatability, or do not have the potential for large - scale applications. ### Solutions 1. **Nano - Imprinting Technique** - The authors propose a nano - imprinting technique to create an inhomogeneous strain distribution by pressing a mold into a WS₂ monolayer covered with a heated polymer layer. - This method is flexible, scalable, and cost - effective, suitable for large - scale production and commercial applications. 2. **Experimental Setup** - A custom - made experimental setup, including a sample stage, a micrometer - positioning stage, and a sample heater, is used to control the temperature during the imprinting process. - A constant and controlled pressure is applied by a voice - coil actuator to ensure precise control of the strain distribution. 3. **Strain Verification** - The imprinted strain distribution is verified by hyperspectral optical imaging, and the energy change of the A exciton in the WS₂ monolayer is extracted as an indicator of strain. - Experimental results show that near the imprinted area, the exciton energy has a significant red - shift, corresponding to a uniaxial tensile strain of approximately 0.34%. ### Conclusions - The authors have successfully demonstrated how to use nano - imprinting technology to create a micrometer - scale strain gradient in a WS₂ monolayer. - By optimizing the imprinting parameters or designing different three - dimensional mold patterns, the magnitude and shape of the strain can be further controlled. - This technology is scalable and is expected to be applied in commercial photoelectric devices, providing an important basis for future applications of strain - modulated two - dimensional materials. ### Formula - Strain - dependence of exciton energy: \[ \Delta E=- 50\text{ meV}\times\frac{\Delta\epsilon}{\%} \] where \(\Delta E\) is the change in exciton energy and \(\Delta\epsilon\) is the percentage of strain. Through this method, researchers can precisely control the strain distribution in two - dimensional materials, providing new possibilities for future device applications.

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