Abstract:The new EUV Lithography tools for IC High Volume Manufacture at 22nm make use of EUV radiation at \lambda = 13.5nm. High power Laser (LPP) and Discharge (DPP)EUV light sources are based on Sn plasmas for the optimum conversion of electrical power to in-band radiation. Sn-fueled sources emit debris such as Sn particles in a rather wide energy spectrum: from thermalized Sn to several tens keV fast ions. Tin interaction with the collector mirrors surfaces facing the high power EUV light source leads to the degradation of the optical performance and productivity of the litho tool, therefore debris must be suppressed and the surface modification of the mirror materials during the particle irradiation must be carefully investigated both theoretically and experimentally. For DPP Sn-fueled sources the collector is a grazing incidence mirror that reflects the EUV light in the grazing angle range from about 1\degree to 20\degree. The most used material for these collector mirrors is Ru. The knowledge of the interaction process of Sn particles at different energies and angles with Ru mirrors is crucial to understand mirror degradation and to tune the parameters of the source and of the debris suppression devices to reach optimal mirror lifetime. We carried out a study of the modification of the ruthenium surface exposed to the simultaneous flux of thermalized and energetic Sn at grazing incidence, for energies varying from 300eV to 30keV. The computational study is performed with the Monte Carlo codes TRIDYN and TRIM.SP based on binary collision approximation assumptions. These tools allow to follow dynamically and at steady state the evolution of the surface composition and to model surface binding energy and density for predicting sputtering, reflection, ion-assisted deposition and depth profiles in the nm surface region.

Time-frequency analysis assisted reconstruction of ruthenium optical constants in the sub-EUV spectral range 8nm-23.75nm

Non-contact XUV metrology of Ru/B4C multilayer optics by means of Hartmann wavefront analysis

Annealing Effects on the Interband Transition and Optical Constants of Ruthenium (IV) Oxide (RuO2) and Ruthenium (VIII) Oxide (RuO4) Nano Thin Films in Cancer Cells, Tissues and Tumors under Synchrotron and Synchrocyclotron Radiations

Laser-induced electron dynamics and surface modification in ruthenium thin films

Material-specific high-resolution table-top extreme ultraviolet microscopy

Resolving ruthenium: XPS studies of common ruthenium materials

Optical Coherence Tomography of Van Der Waals Heterostructures Using Extreme Ultraviolet Light

IRIXS Spectrograph: an ultra high-resolution spectrometer for tender RIXS

Experimental determination of ruthenium L-shell fluorescence yields and Coster-Kronig transition probabilities

X-ray reflectivity with a twist: quantitative time-resolved X-ray reflectivity using monochromatic synchrotron radiation

Femtosecond Laser-Induced Emission of Coherent Terahertz Pulses from Ruthenium Thin Films

Absorbance Measurement of Polymers at Extreme Ultraviolet Wavelength: Correlation Between Experimental and Theoretical Calculations

Grazing incidence-X-ray fluorescence for a dimensional and elemental characterization of well-ordered nanostructures

Intellectual fitting of hard X-ray resonant reflectance maps obtained for low-contrast oxide multilayers across L absorption edges of Eu and Gd

Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy

Grazing incidence interaction of Sn particles with EUV Lithography ruthenium mirrors

Harnessing transformation optics for understanding electron energy loss and cathodoluminescence

Ultrahigh Resolution X-ray Thomson Scattering Measurements at the European XFEL

Optical Identification of Materials Transformations in Oxide Thin Films

Absolute Determination of Optical Constants by Reflection Electron Energy Loss Spectroscopy

Non-Destructive, High-Resolution, Chemically Specific, 3D Nanostructure Characterization using Phase-Sensitive EUV Imaging Reflectometry