Phase shifting thin film multilayers for Michelson interferometers

S H McCall,J A Dobrowolski,G G Shepherd
DOI: https://doi.org/10.1364/AO.28.002854
1989-07-15
Abstract:The design and construction of a set of four high reflectance metal-dielectric thin film multilayers which produce phase changes on reflection that differ by 90 degrees in the 0.55-0.77-microm spectral range are described. This provides the basis for a new type of optical Doppler Michelson imaging interferometer for use in upper atmospheric studies in which achromatic phase shifts are produced without mirror motions.
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